Development of 157 nm positive resists
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Publications
24912 results for Exploratory Science
Comprehensive model for nitrogen diffusion in silicon
- Lahir Shaik Adam
- Mark E. Law
- et al.
- 2001
- Technical Digest-International Electron Devices Meeting
PaperBurstein-Moss shift of n-doped In0.53Ga0.47As/inp
- Martín Muñoz
- Fred H. Pollak
- et al.
- 2001
- Physical Review B - CMMP
PaperThe turbo decoding algorithm and its phase trajectories
- Dakshi Agrawal
- Alexander Vardy
- 2001
- IEEE Trans. Inf. Theory
PaperOxide electrodes for buried-channel field effect transistors
- A.G. Schrott
- J. Misewich
- et al.
- 2001
- Materials Research Society Symposium - Proceedings
PaperTime-space tradeoffs for branching programs
- Paul Beame
- T.S. Jayram
- et al.
- 2001
- Journal of Computer and System Sciences
PaperNovel fluoropolymers for use in 157 nm lithography
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- J. Photopolym. Sci. Tech.
PaperAlternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
- Lars W. Liebmann
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperOn String Replacement Exponentiation
- L.J. O'Connor
- 2001
- Designs, Codes, and Cryptography
PaperHandwritten character membership function estimation for word recognition
- Hichem Frigui
- Paul Gader
- et al.
- 2001
- FUZZ
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