Local electrochemical oxidation/reduction: First step towards a new lithography?
- Jean-Pierre Locquet
- Frédéric Arrouy
- et al.
- 1995
- Applied Physics Letters
Paper
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2351 results at Applied Physics Letters
Dopant interactions during the diffusion of arsenic and boron in opposite directions in polycrystalline/monocrystalline silicon structures
- Joachim N. Burghartz
- Carol L. Stanis
- et al.
- 1995
- Applied Physics Letters
PaperOn the formation of epitaxial CoSi2 from the reaction of Si with a Co/Ti bilayer
- S.-L. Zhang
- J. Cardenas
- et al.
- 1995
- Applied Physics Letters
PaperMagnetic field induced broadening of the resistive transition in epitaxial c-axis-oriented HgBa2CaCu2O6+δ films
- M. Rupp
- A. Gupta
- et al.
- 1995
- Applied Physics Letters
PaperGrowth and giant magnetoresistance properties of La-deficient La xMnO3-δ (0.67≤x≤1) films
- A. Gupta
- T.R. McGuire
- et al.
- 1995
- Applied Physics Letters
PaperReduction of the C54-TiSi2 phase transformation temperature using refractory metal ion implantation
- R. Mann
- G.L. Miles
- et al.
- 1995
- Applied Physics Letters
PaperThermal stability of undoped strained Si channel SiGe heterostructures
- H. Klauk
- T.N. Jackson
- et al.
- 1995
- Applied Physics Letters
PaperCu segregation at the Al(Cu)/Al2O3 interface
- M. Copel
- K.P. Rodbell
- et al.
- 1995
- Applied Physics Letters
PaperFlexible giant magnetoresistance sensors
- S.S.P. Parkin
- 1995
- Applied Physics Letters
PaperLarge second-order optical nonlinearities in pulsed laser ablated silicon carbide thin films
- Paul M. Lundquist
- H.C. Ong
- et al.
- 1995
- Applied Physics Letters
Paper