Across wafer etch rate uniformity in a high density plasma reactor: Experiment and modeling
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- et al.
- 1995
- Applied Physics Letters
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2351 results at Applied Physics Letters
Transport and magnetic properties of in situ grown thin-film La-Y-Ca-Mn-O
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- et al.
- 1995
- Applied Physics Letters
PaperPulsed ultraviolet laser deposition of SiO2 films at 248 nm
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- 1995
- Applied Physics Letters
PaperFormation of Al-Cu via/interconnect by low-pressure collimated sputtering
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- 1995
- Applied Physics Letters
PaperEnhancement of transport critical current densities at 75 K in(Bi,Pb) 2Sr2Ca2Cu3Oy /Ag tapes by means of fission tracks from irradiation by 0.8 GeV protons
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- et al.
- 1995
- Applied Physics Letters
PaperIn situ x-ray diffraction analysis of the C49-C54 titanium silicide phase transformation in narrow lines
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- et al.
- 1995
- Applied Physics Letters
PaperExtremely high electron mobility in Si/SiGe modulation-doped heterostructures
- K. Ismail
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- et al.
- 1995
- Applied Physics Letters
PaperHistory dependent domain structures in giant-magnetoresistive multilayers
- H.T. Hardner
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- et al.
- 1995
- Applied Physics Letters
PaperRecombination in GaAs at the AlAs oxide-GaAs interface
- J.A. Kash
- B. Pezeshki
- et al.
- 1995
- Applied Physics Letters
PaperRelaxation mechanism of Ge islands/Si(001) at low temperature
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- 1995
- Applied Physics Letters
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