Study of end of range loop interactions with B+ implant damage using a boron doped diffusion layer
- J.K. Listebarger
- H.G. Robinson
- et al.
- 1995
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
A kinetic study of the C49 to C54 TiSi2 conversion using electrical resistivity measurements on single narrow lines
- K.L. Saenger
- C. Cabral
- et al.
- 1995
- Journal of Applied Physics
PaperStoichiometry reversal in the growth of thin oxynitride films on Si(100) surfaces
- D.G.J. Sutherland
- H. Akatsu
- et al.
- 1995
- Journal of Applied Physics
PaperScattering from strain variations in high-mobility Si/SiGe heterostructures
- R.M. Feenstra
- M.A. Lutz
- 1995
- Journal of Applied Physics
PaperCharacteristics of thermal stresses in Al(Cu) fine lines. II. Passivated line structures
- I.-S. Yeo
- S.G.H. Anderson
- et al.
- 1995
- Journal of Applied Physics
PaperProperties of amorphous diamond films prepared by a filtered cathodic arc
- Richard Lossy
- David L. Pappas
- et al.
- 1995
- Journal of Applied Physics
PaperMeasurements of alloy composition and strain in thin GexSi 1-x layers
- J.C. Tsang
- P.M. Mooney
- et al.
- 1994
- Journal of Applied Physics
PaperNucleation of dislocations in SiGe layers grown on (001)Si
- P.M. Mooney
- F.K. LeGoues
- et al.
- 1994
- Journal of Applied Physics
PaperAtomic layer epitaxy of Si on Ge(100): Direct recoiling studies of film morphology
- D.D. Koleske
- S. Gates
- 1994
- Journal of Applied Physics
PaperElectrical transport properties of Cu3Ge thin films
- M.O. Aboelfotoh
- K.N. Tu
- et al.
- 1994
- Journal of Applied Physics
Paper