Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
Conference paper
Publications
24867 results for Exploratory Science
Is selective CVD an improvement for the titanium silicide process in sub-quarter micron technology? A phase formation study using x-ray diffraction
- R.A. Roy
- Cryil Cabral Jr.
- et al.
- 1998
- MRS Spring Meeting 1998
Conference paperSubstrate designs and contacts for organic light-emitting displays
- E.I. Haskal
- H. Vestweber
- et al.
- 1998
- SPIE Optical Science, Engineering, and Instrumentation 1998
Conference paperCounting Longest Paths to Guide Neighborhood Search for Large-Scale Job Shop Scheduling
- K. Steinhöfel
- A. Albrecht
- et al.
- 1998
- International Conference on Computer Science and Informatics 1998
Conference paperDesigning a testable System on a Chip
- S.V. Kosonocky
- A.A. Bright
- et al.
- 1998
- VTS 1998
Conference paperHigh-performance sub-0.08 μm CMOS with dual gate oxide and 9.7 ps inverter delay
- M. Hargrove
- S.W. Crowder
- et al.
- 1998
- IEDM 1998
Conference paperCharacterization of a next generation step-and-scan system
- Timothy J. Wiltshire
- Joseph P. Kirk
- et al.
- 1998
- SPIE Advanced Lithography 1998
Conference paperA "Container" MIB for end-to-end management of ADSL networks
- Andy G. Lean
- Frank A. Schaffa
- et al.
- 1998
- SPIE SYBEN-Broadband European Networks and Electronic Image Capture and Publishing 1998
Conference paperApplication of the partial element equivalent circuit (PEEC) method to realistic printed circuit board problem
- A.E. Ruehli
- A.C. Cangellaris
- 1998
- EMC 1998
Conference paperReactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
Conference paper