Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper
Publications
26911 results for Science
Polymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperLine edge roughness in positive-tone chemically amplified resists: Effect of additives and processing conditions
- Qinghuang Lin
- Dario L. Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperThe rational design of bleachable non-chemically amplified DUV photoactive compounds
- Benjamen M. Rathsack
- Peter I. Tattersall
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperCharacterization of thin and ultrathin polymer and resist films
- Dario L. Goldfarb
- Qinhuang Lin
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperImage collapse issues in photoresist
- John Simons
- Dario Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperPost-modification as a way to improve the lithographic performance of resist materials
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperEpitaxial Bain path of tetragonal Fe
- S.L. Qiu
- Hong Ma
- et al.
- 2001
- Physical Review B - CMMP
PaperAutomated search method for AFM and profilers
- Michael Ray
- Yves C. Martin
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperFeature-shape and line-edge roughness measurement of deep sub-micron lithographic structures using small-angle neutron scattering
- Eric K. Lin
- Wen-li Wu
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper