Extension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998
Conference paper
Publications
24910 results for Exploratory Science
Probabilistic model for the mechanism of phenolic polymer dissolution
- Lewis W. Flanagin
- Christopher L. McAdams
- et al.
- 1998
- Microlithography 1998
Conference paperThermal instability of the Cu-Ni interface above 200°C
- T.H. Westmore
- J.E.E. Baglin
- et al.
- 1998
- MRS Spring Meeting 1998
Conference paperPhotoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
- Wu-Song Huang
- Ratnam Sooriyakumaran
- et al.
- 1998
- Microlithography 1998
Conference paperPositive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
Conference paperTask-specific visualization design: A case study in operational weather forecasting
- L.A. Treinish
- 1998
- VIS 1998
Conference paperApplying statistical process control to the adaptive rate control problem
- Nelson R. Manohar
- Marc Willebeek-LeMair
- et al.
- 1998
- SPIE Photonics West 1998
Conference paperRange-based bitmap indexing for high cardinality attributes with skew
- Kun-Lung Wu
- Philip S. Yu
- 1998
- COMPSAC 1998
Conference paperOn locally invertible 2-D polynomial convolutional encoders
- A. Dholakia
- H. Koorapaty
- 1998
- ISIT 1998
Conference paperAdvanced negative resists using novel aminoplast crosslinkers
- Ali Afzali-Kushaa
- Jeffrey D. Gelorme
- et al.
- 1998
- Microlithography 1998
Conference paper