Reactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
Conference paper
Publications
24910 results for Exploratory Science
Device design considerations for double-gate, ground-plane, and single-gated ultra-thin SOI MOSFET's at the 25 nm channel length generation
- H.-S. Wong
- David J. Franks
- et al.
- 1998
- IEDM 1998
Conference paperMixing of 28-THz CO2-laser radiation by nanometer thin film Ni-NiO-Ni diodes with difference frequencies up to 176 GHz
- C. Fumeaux
- Fritz K. Kneubühl
- et al.
- 1998
- Proceedings of SPIE - The International Society for Optical Engineering
Conference paperS-STIR: Similarity search through iterative refinement
- Chung-Sheng Li
- John R. Smith
- et al.
- 1998
- IS&T/SPIE Electronic Imaging 1998
Conference paperCharacterization of a next generation step-and-scan system
- Timothy J. Wiltshire
- Joseph P. Kirk
- et al.
- 1998
- SPIE Advanced Lithography 1998
Conference paperTiming analysis and optimization: From devices to systems
- A. Devgan
- Sandip Kundu
- 1998
- ASP-DAC 1998
Conference paperInformation fusion by combining multiple features and classifiers
- J. Mao
- 1998
- ISMIP 1998
Conference paperIdeas for fast and cheap object capture
- P.C.D. Hobbs
- 1997
- Photonics East 1997
Conference paperTwisted nematic modes for liquid-crystal-on-silicon projectors
- K.H. Yang
- Minhua Lu
- 1998
- SPIE Photonics West 1998
Conference paperMagneto-resistive IC memory limitations and architecture implications
- R. Scheuerlein
- 1998
- INVMTC 1998
Conference paper