Alternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
- Lars W. Liebmann
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper
Publications
26911 results for Science
Java and numerical computing
- Ronald F. Boisvert
- José Moreira
- et al.
- 2001
- Computing in Science and Engineering
PaperSingle application model, multiple synchronized views
- Rafah Hosn
- Stéphane H. Maes
- et al.
- 2001
- Proceedings - IEEE International Conference on Multimedia and Expo
PaperFlashflood: A 3D field-based similarity search and alignment method for flexible molecules
- M. Pitman
- W.K. Huber
- et al.
- 2001
- J. Comput. Aided Mol. Des.
PaperMultigrid-like technique for power grid analysis
- Joseph N. Kozhaya
- Sani R. Nassif
- et al.
- 2001
- IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers
PaperOn reactive diffusion: 1 Kinetics, growth and diffusion, 2 equilibrium?
- F.M. D'Heurle
- P. Gas
- et al.
- 2001
- Defect and Diffusion Forum
PaperCorrosive inorganic contamination on wafer surfaces after nickel-iron electroplating formation mechanisms and prevention
- P. Kritzer
- W. Diel
- et al.
- 2001
- Werkstoffe und Korrosion
PaperPrinting meets lithography: Soft approaches to high-resolution printing
- Bruno Michel
- A. Bernard
- et al.
- 2001
- IBM J. Res. Dev
PaperInfluence of trapped and interfacial charges in organic multilayer light-emitting devices
- W. Brütting
- H. Riel
- et al.
- 2001
- IBM J. Res. Dev
PaperApplication hosting for pervasive computing
- S. Hild
- C. Binding
- et al.
- 2001
- IBM Systems Journal
Paper