Alternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
- Lars W. Liebmann
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper
Publications
26931 results for Science
Enhancing security and privacy in biometrics-based authentication systems
- N.K. Ratha
- Jonathan Connell
- et al.
- 2001
- IBM Systems Journal
PaperReal options in leasing: The effect of idle time
- C. Kenyon
- S. Tompaidis
- 2001
- Operations Research
PaperProcessor Verification Using Efficient Reductions of the Logic of Uninterpreted Functions to Propositional Logic
- Randal E. Bryant
- Steven German
- et al.
- 2001
- ACM TOCL
PaperProactive management of software aging
- V. Castelli
- R. Harper
- et al.
- 2001
- IBM J. Res. Dev
PaperDislocation dynamics simulations of dislocation interactions in thin FCC metal films
- Prita Pant
- K.W. Schwarz
- et al.
- 2001
- Materials Research Society Symposium - Proceedings
PaperDissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography
- Hiroshi Ito
- 2001
- IBM J. Res. Dev
PaperExtending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- David R. Medeiros
- Karen E. Petrillo
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperWhen is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperHuman vision and electronic imaging
- Bernice E. Rogowitz
- Thrasyvoulos N. Pappas
- et al.
- 2001
- Journal of Electronic Imaging
Paper