Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in CF4/H2 Plasmas
- W.A. Lanford
- 2019
- JES
Paper
Publications
509 results at JES
The electrochemical oxidation and polymerization of polycyclic hydrocarbons
- Joachim Bargon
- A. Diaz
- 2019
- JES
PaperInterface Properties of Hydrogenated Amorphous Carbon Films on Ge(100) Surfaces
- M. Wittmer
- D. Ugolini
- et al.
- 2019
- JES
PaperVarious Properties of Sputter-Deposited HfB2 Films
- J.M. Eldridge
- A.R. Forouhi
- et al.
- 2019
- JES
PaperRedeposition during Deep Trench Etching
- Jacob Jorne
- 2019
- JES
PaperMS Studies of Anodic Surface Films on Copper Electrodes
- Joseph G. Gordon IIW
- 2019
- JES
PaperShort Time Annealing of Coevaporated Tungsten Silicide Films
- T.O. Sedgwick
- F.M. d'Heurle
- et al.
- 2019
- JES
PaperNovel Polymeric Dissolution Inhibitor for the Design of Sensitive, Dry Etch Resistant, Base-Developable Resist
- Hiroshi Ito
- Elizabeth Flores
- et al.
- 2019
- JES
PaperSimulation of Leveling in Electrodeposition
- John O. Dukovic
- Charles W. Tobias
- 2019
- JES
PaperFeature-Size Dependence of Etch Rate in Reactive Ion Etching
- Young H. Lee
- Zhen H. Zhou
- 2019
- JES
Paper