Stressing and high field transport studies on device-grade SiO2 by ballistic electron emission spectroscopy
- R. Ludeke
- H.J. Wen
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Publications
168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Scanning force microscopy in the dynamic mode using microfabricated capacitive sensors
- N. Blanc
- J. Brugger
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperDesign and performance analysis of a three-dimensional sample translation device used in ultrahigh vacuum scanned probe microscopy
- R.R. Schlittler
- J.K. Gimzewski
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperCu metallization using a permanent magnet electron cyclotron resonance microwave plasma/sputtering hybrid system
- S.M. Gorbatkin
- D.B. Poker
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperHigh resolution electron beam lithography using ZEP-520 and KRS resists at low voltage
- D.M. Tanenbaum
- C.W. Lo
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperAn inquiry concerning the principles of Si 2p core-level photoemission shift assignments at the Si/SiO2 interface
- F.R. McFeely
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperThe electrostatic moving objective lens and optimized deflection systems for microcolumns
- M.G.R. Thomson
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperRole of gas phase reactions in subatmospheric chemical-vapor deposition ozone/TEOS processes for oxide deposition
- I.A. Shareef
- G.W. Rubloff
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperIonized physical vapor deposition of Cu for high aspect ratio damascene trench fill applications
- C. Nichols
- S.M. Rossnagel
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperPredicting in-plane distortion from electron-beam lithography on x-ray mask membranes
- D.L. Laird
- R. Engelstad
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper