Surface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Conference paper
Publications
3608 results for Mathematical Sciences
Combinatorial resist processing studies
- Carl E. Larson
- Gregory M. Wallraff
- 2004
- Microlithography 2004
Conference paperDeep-UV immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperFundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004
Conference paperRinse additives for defect suppression in 193 nm and 248 nm lithography
- Spyridon Skordas
- Ryan L. Burns
- et al.
- 2004
- Microlithography 2004
Conference paperOptimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperAssessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperHigh speed, lateral PIN photodiodes in silicon technologies
- Jeremy D. Schaub
- Steven J. Koester
- et al.
- 2004
- SPIE IOPTO 2004
Conference paperModeling for profile-based process-window metrology
- Christopher P. Ausschnitt
- Shaunee Y. Cheng
- 2004
- Microlithography 2004
Conference paperTaming pattern and focus variation in VLSI design
- Fook-Luen Heng
- Puneet Gupta
- et al.
- 2004
- AMM 2004
Conference paper