Growth of Si on Si(100) via H/Cl exchange and the effect of interfacial boron
- D.D. Koleske
- S. Gates
- et al.
- 1992
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
Temperature measurements of polyimide during KrF excimer laser ablation
- D.P. Brunco
- Michael O. Thompson
- et al.
- 1992
- Journal of Applied Physics
PaperDiffusion barrier properties of TiN films for submicron silicon bipolar technologies
- E. Kobeda
- J. Warnock
- et al.
- 1992
- Journal of Applied Physics
PaperThe relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films
- L. Clevenger
- A. Mutscheller
- et al.
- 1992
- Journal of Applied Physics
PaperKinetic analysis of C49-TiSi2 and C54-TiSi2 formation at rapid thermal annealing rates
- L. Clevenger
- J.M.E. Harper
- et al.
- 1992
- Journal of Applied Physics
PaperApplication of disjoining and capillary pressure to liquid lubricant films in magnetic recording
- C. Mathew Mate
- 1992
- Journal of Applied Physics
PaperHydrodynamic analysis of electron motion in the cathode fall using a Monte Carlo simulation
- M. Dalvie
- R.T. Farouki
- et al.
- 1992
- Journal of Applied Physics
PaperGlassy polarization in the ferroelectric tungsten bronze (Ba,Sr)Nb 2O6
- A.S. Bhalla
- R. Guo
- et al.
- 1992
- Journal of Applied Physics
PaperElectromigration in two-level interconnect structures with Al alloy lines and W studs
- C.-K. Hu
- P.S. Ho
- et al.
- 1992
- Journal of Applied Physics
PaperTantalum as a diffusion barrier between copper and silicon: Failure mechanism and effect of nitrogen additions
- Karen Holloway
- Peter M. Fryer
- et al.
- 1992
- Journal of Applied Physics
Paper