193 nm photoresist r&d: the risk & challenge
- Donald C. Hofer
- Robert Allen
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Paper
Publications
24879 results for Exploratory Science
Half-integer flux quantum effect in tricrystal cuprate superconductors
- C.C. Tsuei
- J.R. Kirtley
- et al.
- 1996
- Physica C: Superconductivity and its Applications
PaperCertifying permutations: noninteractive zero-knowledge based on any trapdoor permutation
- Mihir Bellare
- Moti Yung
- 1996
- Journal of Cryptology
PaperElectromigration drift velocity in Al-alloy and Cu-alloy lines
- C.-K. Hu
- K.Y. Lee
- et al.
- 1996
- JES
PaperHow to run algorithmic information theory on a computer: Studying the limits of mathematical reasoning
- Gregory J. Chaitin
- 1996
- Complexity
PaperMicroporous polycyanurate networks
- J.L. Hedrick
- T.P. Russell
- et al.
- 1996
- J Polym Sci Part A
PaperA study of X-ray reflectivity data analysis methods for thin film thickness determination
- D.T. Brower
- R.E. Revay
- et al.
- 1996
- Powder Diffraction
PaperTerrestrial cosmic rays
- J.F. Ziegler
- 1996
- IBM J. Res. Dev
PaperStressing and high field transport studies on device-grade SiO2 by ballistic electron emission spectroscopy
- R. Ludeke
- H.J. Wen
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperComparing Information Without Leaking It
- Ronald Fagin
- Moni Naor
- et al.
- 1996
- Communications of the ACM
Paper