Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Conference paper
Publications
26914 results for Science
A new family of non-chemically amplified resists
- Ari Aviram
- Marie Angelopoulos
- et al.
- 1998
- Microlithography 1998
Conference paperDevice design considerations for double-gate, ground-plane, and single-gated ultra-thin SOI MOSFET's at the 25 nm channel length generation
- H.-S. Wong
- David J. Franks
- et al.
- 1998
- IEDM 1998
Conference paperEffective damping for rotating disks at super-critical speeds
- Fu-Ying Huang
- C.D. Mote Jr.
- 2002
- SPIE Smart Structures and Materials 2002
Conference paperExtension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998
Conference paperDUV stability of carbon films for attenuated phase shift mask applications
- Alessandro Callegari
- Katherina Babich
- et al.
- 1998
- SPIE Advanced Lithography 1998
Conference paperUse of micro-mechanical techniques, AFM and MFM to access surface deformation in multilayered thin films
- T.W. Wu
- J.E. Frommer
- 1998
- MRS Spring Meeting 1998
Conference paperOn locally invertible 2-D polynomial convolutional encoders
- A. Dholakia
- H. Koorapaty
- 1998
- ISIT 1998
Conference paperRange-based bitmap indexing for high cardinality attributes with skew
- Kun-Lung Wu
- Philip S. Yu
- 1998
- COMPSAC 1998
Conference paperApplication of the partial element equivalent circuit (PEEC) method to realistic printed circuit board problem
- A.E. Ruehli
- A.C. Cangellaris
- 1998
- EMC 1998
Conference paper