Does line edge roughness matter?: FEOL and BEOL perspectives
- Qinghuang Lin
- Chuck Black
- et al.
- 2003
- Microlithography 2003
Publications
3599 results for Mathematical Sciences
Diffusion induced line edge roughness
- Michael D. Stewart
- Gerard M. Schmid
- et al.
- 2003
- Microlithography 2003
Hardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Characterization of photoresist spatial resolution by interferometric lithography
- John A. Hoffnagle
- William D. Hinsberg
- et al.
- 2003
- Microlithography 2003
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003
Impact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
The estimated impact of shot noise in extreme ultraviolet lithography
- Jonathan Cobb
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Selective enhancement of contrast blocks for MPEG/JPEG image compression
- Konstantin Y. Kupeev
- Zohar Sivan
- 2003
- VCIP 2003
Rational design in cyclic olefin resists for sub-100nm lithography
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2003
- Microlithography 2003
X-ray absorption spectroscopy to probe interfacial issues in photolithography
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2003
- Microlithography 2003