Polyelectrolyte effects in model photoresist developer solutions: Roles of base concentration and added salts
- Vivek M. Prabhu
- Ronald L. Jones
- et al.
- 2003
- Microlithography 2003
Conference paper
Publications
3608 results for Mathematical Sciences
Hardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
Conference paperDeprotection volume characteristics and line edge morphology in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2003
- Microlithography 2003
Conference paperHigh flexibility scalable image coding
- Pascal Frossard
- Pierre Vandergheynst
- et al.
- 2003
- VCIP 2003
Conference paperThe estimated impact of shot noise in extreme ultraviolet lithography
- Jonathan Cobb
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Conference paperExtendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Conference paperReinforcement learning with immediate rewards and linear hypotheses
- Naoki Abe
- Alan W. Biermann
- et al.
- 2003
- Algorithmica (New York)
Paper"Feeling" the noise in nanoscale systems: Studies based on ultrasensitive force detection
- D. Rugar
- R. Budakian
- et al.
- 2003
- SPIE International Symposium on Fluctuations and Noise 2003
Conference paperUsing attribute value lattice to find closed frequent itemsets
- T.Y. Lin
- Xiaohua Tony Hu
- et al.
- 2003
- SPIE AeroSense 2003
Conference paper"Feeling" the noise in nanoscale systems: Studies based on ultrasensitive force detection
- D. Rugar
- R. Budakian
- et al.
- 2003
- SPIE International Symposium on Fluctuations and Noise 2003
Conference paper