Etch correction and OPC, a look at the current state and future of etch correction
- Ian Stobert
- Derren Dunn
- 2013
- SPIE Advanced Lithography 2013
Conference paper
Publications
9289 results for Computer Science
Advanced plasma etch for the 10nm node and beyond
- 2013
- SPIE Advanced Lithography 2013
Conference paperPattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperMonitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperEnhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution
- Greg McIntyre
- Leon Teeuwen
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperDynamic QOS optimization architecture for cloud-based DDDAS
- Tao Chen
- Rami Bahsoon
- et al.
- 2013
- ICCS 2013
Conference paperDevelopment of KrF hybrid resist for a dual isolation application
- Sen Liu
- Steven Holmes
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperDeterministically isolated gratings through the directed self-assembly of block copolymers
- Gregory Sadasdf Doerk
- Joy Y. Cheng
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperEnabling reverse tone imaging for via levels using attenuated Phase Shift Mask and source optimization
- Bassem Hamieh
- Hyun Chol Choi
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperDirected self-assembly process implementation in a 300mm pilot line environment
- Chi-Chun Liu
- I. Cristina Estrada-Raygoza
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paper