Acid-catalyzed single-layer resists for ArF lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1993
- Microlithography 1993
Conference paper
Publications
24880 results for Exploratory Science
The influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists
- V. Rao
- W.D. Hinsberg
- et al.
- 1993
- Microlithography 1993
Conference paperInfluence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Conference paperMolecular design for stabilization of chemical amplification resist toward airborne contamination
- Hiroshi Ito
- William P. England
- et al.
- 1993
- Microlithography 1993
Conference paperFabrication of extremely thin silicon on insulator for fully-depleted CMOS applications
- A. Bindal
- N. Rovedo
- et al.
- 1993
- Thin Solid Films
PaperAn improved detection model for DCT coefficient quantization
- Heidi A. Peterson
- Albert J. Ahumada
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperData structures and perceptual structures
- Bernice E. Rogowitz
- Lloyd A. Treinish
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperPorting a calibrated color image across corporate boundaries
- Fred Mintzer
- Ed Pariser
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperLossy compression of palettized images
- Yung Chen
- Heidi Peterson
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperCrystal growth of (110) and (103) YBa2Cu3O7 thin films in-situ deposited by laser ablation on (110) SrTiO3 single-crystal substrates
- M. Guilloux-Viry
- C. Thivet
- et al.
- 1993
- Journal of Crystal Growth
Paper