Rim phase-shift mask combined with off-axis illumination: A path to 0.5Λ/NA geometries
- T.A. Brunner
- 1993
- Microlithography 1993
Conference paper
Publications
24880 results for Exploratory Science
170 nm gates fabricated by phase-shift mask and top anti-reflector process
- T.A. Brunner
- P.N. Sanda
- et al.
- 1993
- Microlithography 1993
Conference paperVector diffraction analysis of phase-mask imaging in photoresist films
- Donis G. Flagello
- Alan E. Rosenbluth
- 1993
- Microlithography 1993
Conference paperTAR processing for CD control in I-line and 248 nm lithography
- Christopher Lyons
- Nicholas Eib
- et al.
- 1993
- Microlithography 1993
Conference paperDevelopments in 2D AFM metrology
- Diana Nyyssonen
- 1993
- Microlithography 1993
Conference paperProcess optimization of APEX-E
- Karen Petrillo
- 1993
- Microlithography 1993
Conference paperPost-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
Conference paperA tetrahedral interpolation technique for color space conversion
- James M. Kasson
- Wil Plouffe
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperSpectral hole-burning of Nd3+-doped heavy metal fluoride glasses
- R.M. Macfarlane
- B. Jacquier
- 1993
- Journal of Non-Crystalline Solids
PaperFinite-model theory - a personal perspective
- 1993
- Theoretical Computer Science
Paper