193 nm photoresist r&d: the risk & challenge
- Donald C. Hofer
- Robert Allen
- et al.
- 1996
- J. Photopolym. Sci. Tech.
Paper
Publications
26934 results for Science
XPS analysis of fluorinated polyimides
- L.P. Buchwalter
- 1996
- Journal of Adhesion Science and Technology
PaperAn extension of Van Gelder's alternating fixpoint to magic programs
- Shinichi Morishita
- 1996
- Journal of Computer and System Sciences
PaperProgress in 193 nm positive resists
- R.D. Allen
- R. Soortyakumaran
- et al.
- 1996
- J. Photopolym. Sci. Tech.
PaperDendrimers and hyperbranched polymers: Two families of three-dimensional macromolecules with similar but clearly distinct properties
- Jean M. J. Fréchet
- Craig J. Hawker
- et al.
- 1996
- Journal of Macromolecular Science - Pure and Applied Chemistry
PaperRobust characterizations of polynomials with applications to program testing
- Ronitt Rubinfeld
- Madhu Sudan
- 1996
- SIAM Journal on Computing
PaperOptimal clock synchronization under different delay assumptions
- Hagit Attiya
- Amir Herzberg
- et al.
- 1996
- SIAM Journal on Computing
PaperWettability of polished silicon oxide surfaces
- Richard R. Thomas
- Frank B. Kaufman
- et al.
- 1996
- JES
PaperOrigin of the φ ∼ ±9° peaks in YBa2Cu3O7-δ films grown on cubic zirconia substrates
- D.G. Schlom
- E.S. Hellman
- et al.
- 1996
- Journal of Materials Research
PaperImpact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions
- I. Teerlinck
- P.W. Mertens
- et al.
- 1996
- JES
Paper