Fluorocarbon high density plasma. VI. Reactive ion etching lag model for contact hole silicon dioxide etching in an electron cyclotron resonance plasma
- M. Surendra
- 1994
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Publications
25372 results for Science
Shallow n+ Junctions in Silicon by Arsenic Gas-Phase Doping
- J.F. DeGeolormo
- D.K. Sodana
- et al.
- 1994
- JES
PaperMicro-impact technique and its applications
- T.W. Wu
- Chih-Kung Lee
- 1994
- Journal of Materials Research
PaperMultidimensional Indexing for Recognizing Visual Shapes
- Andrea Califano
- Rakesh Mohan
- 1994
- IEEE Transactions on Pattern Analysis and Machine Intelligence
PaperPhotolithography overview for 64 megabit production
- T. Leslie
- W. Arden
- et al.
- 1994
- Microelectronic Engineering
PaperHigh-Order Spectral-Null Codes—Constructions and Bounds
- Ron M. Roth
- Paul H. Siegel
- et al.
- 1994
- IEEE Trans. Inf. Theory
PaperTerminal attachment of perfluorinated polymers to solid surfaces
- J. Rühe
- G.S. Blackman
- et al.
- 1994
- Journal of Applied Polymer Science
PaperOn the conservation law and the performance space of single server systems
- L. Georgiadis
- Ioannis Viniotis
- 1994
- Operations Research
PaperThe k-dimensional distribution of combined gfsr sequences
- Shu Tezuka
- 1994
- Mathematics of Computation
PaperImprecise Computations
- Jane W. S. Liu
- Wei-Kuan Shih
- et al.
- 1994
- Proceedings of the IEEE
Paper