Explosive silicidation in nickel/amorphous-silicon multilayer thin films
- L. Clevenger
- C.V. Thompson
- et al.
- 1990
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
Thermal stability of the Cu/Ta/PtSi structures
- Chin-An Chang
- 1990
- Journal of Applied Physics
PaperMeasurements of charge on submicron particles generated in a sputtering process
- Jin Jwang Wu
- Robert J. Miller
- 1990
- Journal of Applied Physics
PaperA temperature-independent capacitance in semiconductor-insulator- semiconductor capacitors
- T.W. Hickmott
- P. Solomon
- 1990
- Journal of Applied Physics
PaperFormation of copper silicides from Cu(100)/Si(100) and Cu(111)/Si(111) structures
- Chin-An Chang
- 1990
- Journal of Applied Physics
PaperEffects of C+ implantation on the interdiffusion and resistivity of Cu/Ni/Au thin films
- Peter Madakson
- J. Karasinski
- 1990
- Journal of Applied Physics
PaperOxidation of titanium, manganese, iron, and niobium silicides: Marker experiments
- L. Stolt
- O. Thomas
- et al.
- 1990
- Journal of Applied Physics
PaperDetermination of surface magnetic profiles of thin Permalloy films using ferromagnetic resonance (abstract)
- K. Ounadjela
- V.S. Speriosu
- et al.
- 1990
- Journal of Applied Physics
PaperFormation, oxidation, electronic, and electrical properties of copper silicides
- A. Cros
- M.O. Aboelfotoh
- et al.
- 1990
- Journal of Applied Physics
PaperLarge magnetoresistance anisotropy in a new class of amorphous ferromagnets: U100-x-ySbxMny
- P. Freitas
- T.S. Plaskett
- 1990
- Journal of Applied Physics
Paper