Improved reflectivity control of APEX-E positive tone deep-UV photoresist
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- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
Conference paper
Publications
26904 results for Science
Materials evaluation of antireflective coatings for single-layer 193-nm lithography
- Roderick R. Kunz
- Robert D. Allen
- 1994
- Microlithography 1994
Conference paper(1) Recent developments in VUV femtosecond pulse generation; (2) proposal for a higher efficiency F2 (157-nm) laser
- J.H. Glownia
- D.R. Gnass
- et al.
- 1994
- SPIE OE/LASE 1994
Conference paperEnhancement of Curie temperature in amorphous CoY alloys
- Yoshiro Kakehashi
- Ming Yu
- et al.
- 1994
- Materials Science and Engineering A
PaperTheoretical analysis of light-inductive forces in scanning probe microscopy
- Christian Girard
- Alain Dereux
- et al.
- 1994
- Physical Review B
PaperTemperature dependence of the electron-spin resonance in nitrogen-rich amorphous silicon nitride
- D. Chen
- J.M. Viner
- et al.
- 1994
- Physical Review B
PaperFerromagnetism and spin glass in amorphous FeZr alloys
- M. Yu
- Y. Kakehashi
- et al.
- 1994
- Materials Science and Engineering A
PaperOne-dimensional image state on stepped Cu(100)
- J.E. Ortega
- F.J. Himpsel
- et al.
- 1994
- Physical Review B
PaperUnoccupied states of Cr on Au(100), Ag(100), and Cu(100)
- M.E. Haugan
- Qibiao Chen
- et al.
- 1994
- Physical Review B
PaperGaAs c(4×4) surface structure in organometallic vapor-phase epitaxy
- A.P. Payne
- P.H. Fuoss
- et al.
- 1994
- Physical Review B
Paper