Novel chemically amplified dry-developing imaging materials for high resolution microlithography
- J.M.J. Frchet
- J. Fahey
- et al.
- 1992
- J. Photopolym. Sci. Tech.
Paper
Publications
24904 results for Exploratory Science
Reactive ion etching technology in thin-film-transistor processing
- Y. Kuo
- 1992
- IBM J. Res. Dev
PaperConstruction of asymptotically good low-rate error-correcting codes through pseudo-random graphs
- Noga Alon
- Jehoshua Bruck
- et al.
- 1992
- IEEE Trans. Inf. Theory
PaperA new fixed point approach for stable networks and stable marriages
- Tomás Feder
- 1992
- Journal of Computer and System Sciences
PaperInter enterprise CIM-a mechanism for graduate education
- Peter Sackett
- David McCluney
- 1992
- Robotics and Computer Integrated Manufacturing
PaperEvidence for collective flux pinning from magnetic relaxation combined with I-V characteristics in YBCO thin films
- E. Sandvold
- C. Rossel
- 1992
- Physica C: Superconductivity and its applications
PaperPolysilane photoresists for 193 and 248 nm lithography
- G.M. Wallraff
- R.D. Miller
- et al.
- 1992
- J. Photopolym. Sci. Tech.
PaperA performance study of tetrahedral and hexahedral elements in 3-D finite element structural analysis
- A.O. Cifuentes
- A. Kalbag
- 1992
- Finite Elements in Analysis and Design
PaperCharacterization of chemical bonding and physical characteristics of diamond-like amorphous carbon and diamond films
- Joel W. Ager
- Andrew J. Kellock
- 1992
- Journal of Materials Research
PaperSome Factors Affecting Hillock Formation due to PECVD Processing of Sputtered Al-4% Cu-1% Si Films
- V.J. Minkiewicz
- J.O. Moore
- et al.
- 1992
- JES
Paper