Alternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
- Lars W. Liebmann
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
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Publications
3613 results for Mathematical Sciences
When is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperEvaluation of molybdenum silicide for use as a 193 nm phase-shifting absorber in photomask manufacturing
- M. Hibbs
- M. Ushida
- et al.
- 2001
- Proceedings of SPIE- The International Society for Optical Engineering
PaperUse of KRS-XE positive chemically amplified resist for optical mask manufacturing
- Brian Ashe
- Christina Deverich
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperFoveated wavelet image quality index
- Zhou Wang
- Alan C. Bovik
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperA cost-benefit study of consumer product take back programs using IBM's WIT reverse logistics optimization tool
- Pitipong Veerakamolmal
- Yung-Joon Lee
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperCAMEL: Concept Annotated iMagE Libraries
- Apostol (Paul) Natsev
- Atul Chadha
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperDeveloping a 2.5-D video Avatar
- Ken Tamagawa
- Toshio Yamada
- et al.
- 2001
- IEEE SPM
PaperBest possible approximation algorithm for MAX SAT with cardinality constraint
- M. Sviridenko
- 2001
- Algorithmica (New York)
PaperSimple derivations for two Jacobians of basic importance in multivariate statistics
- David A. Harville
- 2000
- Linear Algebra and Its Applications
Paper