Imma phase of Si: Phase transitions and stability
- S.L. Qiu
- P.M. Marcus
- 2011
- European Physical Journal B
Paper
Publications
14465 results for Physical Sciences
Contact patterning strategies for 32nm and 28nm technology
- Bradley Morgenfeld
- Ian Stobert
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperQualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
- Gregory McIntyre
- Daniel Corliss
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperSpacer-defined double patterning for 20-nm and beyond logic BEOL technology
- Ryoung-Han Kim
- Chiew-Seng Koay
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperApplicability of global source mask optimization to 22/20nm node and beyond
- Kehan Tian
- Moutaz Fakhry
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperRaman and photocurrent imaging of electrical stress-induced p-n junctions in graphene
- Gayathri Rao
- Marcus Freitag
- et al.
- 2011
- ACS Nano
PaperSurface modification of thin film composite membrane support layers with polydopamine: Enabling use of reverse osmosis membranes in pressure retarded osmosis
- Jason T. Arena
- Bryan McCloskey
- et al.
- 2011
- Journal of Membrane Science
PaperEUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperUltimate RF performance potential of carbon electronics
- Siyuranga O. Koswatta
- Alberto Valdes-Garcia
- et al.
- 2011
- IEEE T-MTT
PaperA Manufacturing grade, porous oxycarbosilane spin-on dielectric candidate with K 2.0
- Willi Volksen
- Teddie P. Magbitang
- et al.
- 2011
- JES
Paper