Etch Selectivity of Silicon Dioxide over Titanium Silicide Using CF4/H2 Reactive Ion Etching
- Steve W. Robey
- Gottlieb S. Oehrlein
- 2019
- JES
Paper
Publications
509 results at JES
Determination of partial currents for cuni and cuco electrodeposition using rotating ring-disk electrodes
- Jean Horkans
- I-Chia Hsu Chang
- et al.
- 2019
- JES
PaperSubmicron epitaxial films
- B. Ginsberg
- G.R. Srinivasan
- 2019
- JES
PaperOptimization of Electrodeposit Uniformity by the Use of Auxiliary Electrodes
- S. Mehdizadeh
- J. Dukovic
- et al.
- 2019
- JES
PaperPlasma Etching of Silicon in SF6: Experimental and Reactor Modeling Studies
- Yeong-Jyh Lii
- Jacob Jorné
- et al.
- 2019
- JES
PaperLow Energy Proton Beam Lithography with a Thin Oxygen-Etch Barrier Layer
- H. Hiraoka
- 2019
- JES
PaperReactive Ion Etching of PECVD Amorphous Silicon and Silicon Nitride Thin Films with Fluorocarbon Gases
- Yue Kuo
- 2019
- JES
PaperRefinement of Zinc Silicate Phosphor Synthesis
- I.F. Chong
- J.M. Brownlow
- et al.
- 2019
- JES
PaperInitiation of electroless copper plating using Pd+2/poly(acrylic acid) films
- Robert L. Jackson
- 2019
- JES
PaperRedeposition during Deep Trench Etching
- Jacob Jorne
- 2019
- JES
Paper