Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation
- Y. Vladimirsky
- J.R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
Paper
Publications
221 results at Microelectronic Engineering
Dry ridge etching of AlGaAs GRINSCH lasers
- M. Jost
- P. Buchmann
- et al.
- 1990
- Microelectronic Engineering
PaperCW and time resolved luminescence study of dry etch damage in semiconductor wires
- B.E. Maile
- G. Mayer
- et al.
- 1990
- Microelectronic Engineering
PaperA Single Expose Double Develop (SEDD) process for self-aligned lithographic applications
- Donis Flagello
- Andrew Pomerene
- 1989
- Microelectronic Engineering
PaperHighly selective KOH-based etchant for boron-doped silicon structures
- E. Bassous
- A.C. Lamberti
- 1989
- Microelectronic Engineering
PaperNanolithography at 350 KV in a TEM
- A.N. Broers
- A.E. Timbs
- et al.
- 1989
- Microelectronic Engineering
PaperApplication of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
PaperFully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- David Seeger
- K.T. Kwietniak
- et al.
- 1989
- Microelectronic Engineering
PaperChemically assisted ion beam etching process for high quality laser mirrors
- P. Buchmann
- H.P. Dietrich
- et al.
- 1989
- Microelectronic Engineering
PaperElectron beam lithography of sub-0.1μm circuits
- S. Rishton
- D. Kern
- et al.
- 1989
- Microelectronic Engineering
Paper