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- SPIE Advances in Resist Technology and Processing 1999
Conference paperChemically amplified resists: Past, present, and future
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Conference paperMolecular weight tailoring in methacrylate 193 nm photoresists
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Conference paperNMR analysis of chemically amplified resist films
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Conference paperUse of the Gibbs sampler to invert large, possibly sparse, positive definite matrices
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PaperAssessing the registration of CT-scan data to intra-operative X-rays by fusing X-rays and preoperative information
- A. Gueziec
- 1999
- Proceedings of SPIE - The International Society for Optical Engineering
Conference paper