Defect formation in SiO2/Si(100) by metal diffusion and reaction
- M. Liehr
- H. Dallaporta
- et al.
- 1988
- Applied Physics Letters
Paper
Publications
2351 results at Applied Physics Letters
Efficiency of oxygen plasma cleaning of reactive ion damaged silicon surfaces
- Gottlieb S. Oehrlein
- Gerald J. Scilla
- et al.
- 1988
- Applied Physics Letters
PaperViolet cw neodymium upconversion laser
- R.M. Macfarlane
- F. Tong
- et al.
- 1988
- Applied Physics Letters
PaperNeutral E' centers in microwave downstream plasma-enhanced chemical-vapor-deposited silicon dioxide
- W.L. Warren
- P. Lenahan
- et al.
- 1988
- Applied Physics Letters
PaperContact resistance to undoped and phosphorus-doped hydrogenated amorphous silicon films
- Jerzy Kanicki
- 1988
- Applied Physics Letters
PaperMeasurement of ultrafast hot-carrier relaxation in silicon by thin-film-enhanced, time-resolved reflectivity
- F.E. Doany
- D. Grischkowsky
- 1988
- Applied Physics Letters
PaperHigh-resolution capacitance measurement and potentiometry by force microscopy
- Yves Martin
- David W. Abraham
- et al.
- 1988
- Applied Physics Letters
PaperReaction kinetics of nickel/silicon multilayer films
- L. Clevenger
- C.V. Thompson
- et al.
- 1988
- Applied Physics Letters
PaperLow-temperature amorphous-to-crystalline transformation of CoSi2 films
- A. Cros
- K.N. Tu
- et al.
- 1988
- Applied Physics Letters
PaperSurface processes in CF4/O2 reactive etching of silicon
- Gottlieb S. Oehrlein
- Steve W. Robey
- et al.
- 1988
- Applied Physics Letters
Paper