Fast source independent estimation of lithographic difficulty supporting large scale source optimization
- David Demaris
- Maria Gabrani
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paper
Publications
9271 results for Computer Science
EUV mask line edge roughness
- Amy E. Zweber
- Emily Gallagher
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperComputing exact Fourier series coefficients of IC rectilinear polygons from low-resolution fast Fourier coefficients
- Robin Scheibler
- Paul Hurley
- 2012
- SPIE Advanced Lithography 2012
Conference paperLens heating challenges for negative tone develop layers with freeform illumination: A comparative study of experimental vs. simulated results
- Scott Halle
- Michael Crouse
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperPattern collapse mitigation strategies for EUV Lithography
- Dario L. Goldfarb
- Robert L. Bruce
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperProcess optimization through model based SRAF printing prediction
- Ramya Viswanathan
- Jaione Tirapu Azpiroz
- et al.
- 2012
- SPIE Advanced Lithography 2012
Conference paperOn the SNR penalties of ideal and non-ideal subset diversity systems
- Wesley M. Gifford
- Andrea Conti
- et al.
- 2012
- IEEE Trans. Inf. Theory
PaperA fast and scalable low dimensional solver for charged particle dynamics in large particle accelerators
- Yves Ineichen
- Andreas Adelmann
- et al.
- 2012
- Computer Science - Research and Development
PaperInvestigation of pattern wiggling for spin-on organic hardmask materials
- Goji Wakamatsu
- Kentaro Goto
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Conference paperConductive layer for charge dissipation during electron-beam exposures
- Luisa D. Bozano
- Ratnam Sooriyakumaran
- et al.
- 2012
- Proceedings of SPIE - The International Society for Optical Engineering 2012
Conference paper