Negative chemical amplification resist systems based on polyhydroxystyrenes and N-substituted imides or aldehydes
- Hiroshi Ito
- Klaas Schildknegt
- et al.
- 1991
- Microlithography 1991
Conference paper
Publications
26938 results for Science
Airborne chemical contamination of a chemically amplified resist
- Scott A. MacDonald
- N.J. Clecak
- et al.
- 1991
- Microlithography 1991
Conference paperOptimization of optical properties of resist processes
- T.A. Brunner
- 1991
- Microlithography 1991
Conference paperTbFeCoCr magneto-optical media with high corrosion resistance
- S. Takayama
- T. Kawanabe
- et al.
- 1991
- Journal of Magnetism and Magnetic Materials
PaperCarbon incorporation in metalorganic vapor phase epitaxy grown GaAs using CHyX4 - y, TMG and AsH3
- N.I. Buchan
- T.F. Kuech
- et al.
- 1991
- Journal of Crystal Growth
PaperD-wave, dimer, and chiral states in the two-dimensional Hubbard model
- Alberto Parola
- Sandro Sorella
- et al.
- 1991
- Physical Review B
PaperThe importance of structure and bonding in semiconductor surface chemistry: hydrogen on the Si(111)-7 × 7 surface
- John J Boland
- 1991
- Surface Science
PaperStructural and electronic properties induced by hydrogen adsorption on the GaAs(100) surface
- A.F Wright
- C.Y Fong
- et al.
- 1991
- Surface Science
PaperParticipation of carbon in the electronic structure of YBa2Cu3O7
- P.E. Batson
- T.M. Shaw
- et al.
- 1991
- Physical Review B
PaperThickness dependence of the irreversibility line in YBa2Cu3O7-x thin films
- L. Civale
- T. Worthington
- et al.
- 1991
- Physical Review B
Paper