Plasma chemical aspects of magnetron ion etching with CF4/O 2
- A.A. Bright
- S. Kaushik
- et al.
- 1987
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
Temperature dependence of the magnetic 1/f noise in Eu0.4Sr 0.6S (invited)
- R.H. Koch
- W. Reim
- et al.
- 1987
- Journal of Applied Physics
PaperOxidation temperature dependence of the dc electrical conduction characteristics and dielectric strength of thin Ta2O5 films on silicon
- G.S. Oehrlein
- 1986
- Journal of Applied Physics
PaperInfluence of gas viscosity on the photoacoustic signal in gas-microphone cells
- P. Korpiun
- B. Büchner
- et al.
- 1986
- Journal of Applied Physics
PaperX-ray structures and magnetic properties of sputtered osmium-doped iron oxide thin films
- G. Lim
- T.C. Huang
- et al.
- 1986
- Journal of Applied Physics
PaperOrigin of thickness oscillations in nucleated thin-film silicides
- R. Mark Bradley
- 1986
- Journal of Applied Physics
PaperMeasurement of interface states in palladium silicon diodes
- Howard L. Evans
- Xu Wu
- et al.
- 1986
- Journal of Applied Physics
PaperDoping reaction of PH3 and B2H6 with Si(100)
- Ming L. Yu
- D.J. Vitkavage
- et al.
- 1986
- Journal of Applied Physics
PaperFormation of intermediate phases, Ni3Si2 and Pt 6Si5: Nucleation, identification, and resistivity
- P. Gas
- F.M. D'Heurle
- et al.
- 1986
- Journal of Applied Physics
PaperInfrared thermal particle detection physics
- S. Utterback
- R.L. Melcher
- 1986
- Journal of Applied Physics
Paper