Evaluating Novel Material Stacks Towards Gate Width Roughness Reduction
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Conference paper
Publications
15 results at SPIE Advanced Lithography + Patterning 2025
Quantum Computing and AI: Making it work
- 2025
- SPIE Advanced Lithography + Patterning 2025
KeynoteAccelerated Discovery for a Sustainable Semiconductor Industry
- 2025
- SPIE Advanced Lithography + Patterning 2025
KeynoteMassive E-beam Metrology Characterization of Reticle Stitching Boundaries
- Genevieve Kane
- Connor Smith
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
TalkDry Resist Characterization Towards Technology Insertion for 28-36P EUV Patterning
- Yasiel Cabrera
- Gopal Kenath
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Talk