Implementation of assist features in EUV lithography
- Fan Jiang
- Martin Burkhardt
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper
Publications
24 results at SPIE Advanced Lithography 2015
Fin formation using graphoepitaxy DSA for FinFET device fabrication
- Chi Chun Liu
- Fee Li Lie
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperLow-energy electron (0-100eV) interaction with resists using LEEM
- A. Thete
- Daniël Geelen
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperBest focus shift mechanism for thick masks
- Martin Burkhardt
- Ananthan Raghunathan
- 2015
- SPIE Advanced Lithography 2015
Conference paperTailored molecular glass resists for scanning probe lithography
- Christian Neuber
- Hans-Werner Schmidt
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperDirected self-assembly of topcoat-free, integration-friendly high-χ block copolymers
- Eri Hirahara
- Margareta Paunescu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperEUV processing and characterization for BEOL
- Nicole Saulnier
- Yongan Xu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperPlasma etch challenges with new EUV lithography material introduction for patterning for MOL and BEOL
- Changwoo Lee
- Bhaskar Nagabhirava
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperTrench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)
- Yannick Feurprier
- Katie Lutker-Lee
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperCustomization and design of directed self-assembly using hybrid prepatterns
- Joy Y. Cheng
- Gregory S. Doerk
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paper