High speed electron beam testing
- George Chiu
- Jean-Marc Halbout
- et al.
- 1989
- Microelectronic Engineering
Paper
Publications
221 results at Microelectronic Engineering
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
PaperApplication of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
PaperElectron beam lithography of sub-0.1μm circuits
- S. Rishton
- D. Kern
- et al.
- 1989
- Microelectronic Engineering
PaperNanolithography at 350 KV in a TEM
- A.N. Broers
- A.E. Timbs
- et al.
- 1989
- Microelectronic Engineering
PaperHighly selective KOH-based etchant for boron-doped silicon structures
- E. Bassous
- A.C. Lamberti
- 1989
- Microelectronic Engineering
PaperPhotoemission sampling technique for high-speed integrated-circuit testing
- H. Beha
- H.K. Seitz
- et al.
- 1987
- Microelectronic Engineering
PaperResist image enhancement by UV-, soft vacuum pulsed electron beams and organometallic compounds
- Hiroyuki Hiraoka
- 1987
- Microelectronic Engineering
PaperElectrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates
- S.S. Dana
- J. Batey
- et al.
- 1987
- Microelectronic Engineering
PaperA comparison of the E-beam and UV-sensitivities and relative O2- plasma stabilities of organosilicon polymers.Part II. Lithographic characteristics of polysilphenylene siloxanes and some organic polymers with pendant silyl groups
- E. Babich
- J.M. Shaw
- et al.
- 1987
- Microelectronic Engineering
Paper