Oxygen precipitation retardation and recovery phenomena in Czochralski silicon: Experimental observations, nuclei dissolution model, and relevancy with nucleation issues
- T.Y. Tan
- C.Y. Kung
- 1986
- Journal of Applied Physics
Paper
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2360 results at Journal of Applied Physics
Doping reaction of PH3 and B2H6 with Si(100)
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- D.J. Vitkavage
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- 1986
- Journal of Applied Physics
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- P. Gas
- F.M. D'Heurle
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- 1986
- Journal of Applied Physics
PaperInfrared thermal particle detection physics
- S. Utterback
- R.L. Melcher
- 1986
- Journal of Applied Physics
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- Jennifer S. Green
- Barry L. Farmer
- et al.
- 1986
- Journal of Applied Physics
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- B.Z. Weiss
- K.N. Tu
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- 1986
- Journal of Applied Physics
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- R.F. Broom
- H.P. Meier
- et al.
- 1986
- Journal of Applied Physics
PaperElectrical conduction in polyimide films
- G.M. Sessler
- B. Hahn
- et al.
- 1986
- Journal of Applied Physics
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- G.S. Oehrlein
- 1986
- Journal of Applied Physics
PaperLow-temperature deposition of high-quality silicon dioxide by plasma-enhanced chemical vapor deposition
- J. Batey
- E. Tierney
- 1986
- Journal of Applied Physics
Paper