Smaller, smarter, faster, and more accurate: The new overlay metrology
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Publications
14465 results for Physical Sciences
Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture: Tool-to-tool comparison
- Gregory McIntyre
- Richard Tu
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements
- Johann Foucher
- Narender Rana
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperHysteretic drain-current behavior due to random telegraph noise in scaled-down FETs with high-κ/metal-gate stacks
- Hiroshi Miki
- Naoki Tega
- et al.
- 2010
- IEDM 2010
Conference paperProcessing and moisture effects on TDDB for Cu/ULK BEOL structures
- Eric G. Liniger
- T.M. Shaw
- et al.
- 2010
- ADMETA 2010
Conference paperHybrid reference metrology exploiting patterning simulation
- Narender Rana
- Chas Archie
- 2010
- SPIE Advanced Lithography 2010
Conference paperNonvolatile polymer memory with nanoconfinement of ferroelectric crystals
- Seok Ju Kang
- Insung Bae
- et al.
- 2010
- Nano Letters
PaperAdvanced metallization developments for 32-nm node CMOS technology contact architecture
- Doug H. Lee
- Valli Arunachalam
- et al.
- 2009
- ADMETA 2009
Conference paperCoWP metal caps for reliable 32 nm 1X Cu interconnects in porous ULK (k=2.4)
- E. Huang
- M. Oh
- et al.
- 2009
- ADMETA 2009
Conference paperUV curing-induced photoresist poisoning in advanced ULK BEOL integration schemes
- Y.C. Ee
- D. Kioussis
- et al.
- 2009
- ADMETA 2009
Conference paper