Publications

2360 results at Journal of Applied Physics

Silicon etching mechanism and anisotropy in CF₄+O₂ plasma
- - Young H. Lee
  - Mao-Min Chen
- 1983
- Journal of Applied Physics
Paper
Reduction of contact resistivity by As redistribution during Pd ₂Si formation
- - I. Ohdomari
  - M. Hori
  - et al.
- 1983
- Journal of Applied Physics
Paper
A study of the electrical and luminescence characteristics of a novel Si-based thin film electroluminescent device
- - D.J. Robbins
  - D.J. Dimaria
  - et al.
- 1983
- Journal of Applied Physics
Paper
Redistribution of As during Pd₂Si formation: Electrical measurements
- - M. Wittmer
  - C.-Y. Ting
  - et al.
- 1983
- Journal of Applied Physics
Paper
On the calculation of differential mobility
- - Peter J. Price
- 1983
- Journal of Applied Physics
Paper
Thermal stability of Pb-alloy Josephson junction electrode materials. VII. Concentration range of single ε-phase Pb-Bi films used in counterelectrodes
- - Masanori Murakami
  - H.-C.W. Huang
  - et al.
- 1983
- Journal of Applied Physics
Paper
Intermetallic compound formation in thin-film and in bulk samples of the Ni-Si binary system
- - K.N. Tu
  - G. Ottaviani
  - et al.
- 1983
- Journal of Applied Physics
Paper
Thermal stability of Pb-alloy Josephson junction electrode materials. VIII. Effects of Au addition to Pb-Bi counterelectrodes
- - Masanori Murakami
  - H.-C.W. Huang
  - et al.
- 1983
- Journal of Applied Physics
Paper
Study of polyacetylene and composites of polyacetylene/polyethylene by electron nuclear double resonance, electron nuclear nuclear triple resonance, and electron spin echo spectroscopies
- - L. Dalton
  - H. Thomann
  - et al.
- 1983
- Journal of Applied Physics
Paper
Degradation of thin tellurium films
- - Wen-Yaung Lee
  - R.H. Geiss
- 1983
- Journal of Applied Physics
Paper