Publications

509 results at JES

Reactive ion Etching of Silicon and Silicon Dioxide in CF₄ Plasmas Containing H₂ or C₂F₄ Additives
- - J.P. Simko
- 2019
- JES
Paper
A Diffusion Model for Electron-Hole Recombination in Zn₂SiO₄:(Mn, As) Phosphors
- - D.J. Robbins
  - N. Caswell
  - et al.
- 2019
- JES
Paper
Laser-Enhanced Electrodeposition of Lead-Tin Solder
- - M. Datta
  - L.T. Romankiw
- 2019
- JES
Paper
Reactive Ion Etching of PECVD n⁺ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor Preparation
- - M.S. Crowder
- 2019
- JES
Paper
A Two-Dimensional Process Model for Chemimechanical Polish Planarization
- - J. Warnock
- 2019
- JES
Paper
Computer simulation of boron transport in magnetic czochralski growth of silicon
- - W.E. Langlois
- 2019
- JES
Paper
High temperature process limitation on TiSi2
- - C.-Y. Ting
  - F.M. d'Heurle
  - et al.
- 2019
- JES
Paper
Pit Growth in Nife Thin Films
- - B.M. Rush
  - J. Dukovic
  - et al.
- 2019
- JES
Paper
Grazing Incidence X-Ray and Electrochemical Study of Thin Film Copper(111) on Mica
- - Gary L. Barges
  - Mahesh G. Samant
- 2019
- JES
Paper
Selective Wet and Dry Etching of Hydrogenated Amorphous Silicon and Related Materials
- - I. Haller
  - Y.H. Lee
  - et al.
- 2019
- JES
Paper