Outdiffusion of Si through gold films: The effects of Si orientation, gold deposition techniques and rates, and annealing ambients
- Chin-An Chang
- G. Ottaviani
- 1984
- Applied Physics Letters
Paper
Publications
2351 results at Applied Physics Letters
12-fs ultrashort optical pulse compression at a high repetition rate
- J.-M. Halbout
- D. Grischkowsky
- 1984
- Applied Physics Letters
PaperPolymethyl methacrylate resist sensitivity enhancement in x-ray lithography by in situ polymerization
- W.-T. Liu
- J.C. Corelli
- et al.
- 1984
- Applied Physics Letters
PaperDisilane: A new silicon doping source in metalorganic chemical vapor deposition of GaAs
- T.F. Kuech
- B.S. Meyerson
- et al.
- 1984
- Applied Physics Letters
PaperNoncontact thermal-wave imaging of subsurface structure with infrared detection
- H. Ermert
- F.H. Dacol
- et al.
- 1984
- Applied Physics Letters
PaperEmission spectra, surface quality, and mechanism of excimer laser etching of polyimide films
- G. Koren
- J.T.C. Yeh
- 1984
- Applied Physics Letters
PaperSurface versus bulk magnetization curves in amorphous GdCo cosputtered in the presence of oxygen
- H.C. Siegmann
- E. Kay
- 1984
- Applied Physics Letters
PaperMiniature SQUID susceptometer
- M.B. Ketchen
- T. Kopley
- et al.
- 1984
- Applied Physics Letters
PaperReduction of electron and hole trapping in SiO2 by rapid thermal annealing
- Z.A. Weinberg
- D.R. Young
- et al.
- 1984
- Applied Physics Letters
PaperRapid thermal annealing of boron-implanted silicon using an ultrahigh power arc lamp
- R.T. Hodgson
- V.R. Deline
- et al.
- 1984
- Applied Physics Letters
Paper