Publications

358 results at Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Optical emission characterization of a divergent magnetic field electron cyclotron resonance source
- - John S. McKillop
  - John C. Forster
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
The chemical interaction of Mn with the MoS2(0001) surface studied by high-resolution photoelectron spectroscopy
- - Jeffrey R. Lince
  - Thomas B. Stewart
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Determination of the local electronic structure of atomic-sized defects on Si(001) by tunneling spectroscopy
- - R.J. Hamers
  - U.K. Köhler
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Mechanisms for success or failure of diffusion barriers between aluminum and silicon
- - J.M.E. Harper
  - S.E. Harnstram
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
High-rate reactive sputter deposition of aluminum oxide
- - Fletcher Jones
  - Joseph Logan
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
The angular dependence of preferential sputtering and composition in aluminum-copper thin films
- - P. Rudeck
  - J.M.E. Harper
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Scanning tunneling microscopy study of low-temperature epitaxial growth of silicon on sI(111 )-(7×7)
- - U.K. Köhler
  - J.E. Demuth
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
interface states and Schottky barrier formation at metal/GaAs junctions
- - R.E. Viturrc
  - C. Mailhiot
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Reactive magnetron sputtered zirconium oxide and zirconium silicon oxide thin films
- - Michael A. Russak
  - Christopher V. Jahnes
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Reaction kinetics of surface silicon hydrides
- - C. Michael Greenlief
  - Stephen M. Gates
  - et al.
- 1989
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper