Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- Guillaume Landie
- Yongan Xu
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
9271 results for Computer Science
Critical challenges for "non-critical" layers
- J.M. Gomez
- I.Y. Popova
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperExtending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperPerformance of tri-layer process required for 22nm and beyond
- Yayi Wei
- Martin Glodde
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperOptimization of pitch-split double patterning photoresist for applications at the 16nm node
- Steven J. Holmes
- Cherry Tang
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperSelf-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- Chris Bencher
- Jeffrey Smith
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperComponent rationing for available-to-promise scheduling in configure-to-order systems
- Ching-Hua Chen-Ritzo
- Tom Ervolina
- et al.
- 2011
- EJOR
PaperSingle exposure contacts are dead. Long live single exposure contacts!
- Henning Haffner
- Martin Ostermayr
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperIntegrated model-based retargeting and optical proximity correction
- Kanak B. Agarwal
- Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
Conference paperA new class of array codes for memory storage
- Luis A. Lastras-Montano
- P.J. Meaney
- et al.
- 2011
- ITA 2011
Conference paper