Plasma-assisted etching
- J.W. Coburn
- 1982
- Plasma Chemistry and Plasma Processing
Paper
Publications
26944 results for Science
Hole burning and optically detected fluorine nmr in pr3+: Caf2
- D.P. Burum
- R.M. Shelby
- et al.
- 1982
- Physical Review B
PaperDistinct ln t-dependent resistance of ce1.2mo6s8 under high pressure
- M.K. Wu
- V. Diatschenko
- et al.
- 1982
- Physical Review B
PaperPhase coherence in a weakly coupled array of 20 000 Nb Josephson junctions
- Richard F. Voss
- Richard A. Webb
- 1982
- Physical Review B
PaperAntiferromagnetism in the organic conductor bis-tetramethyltetraselenafulvalene hexafluoroarsenate [(TMTSF)2AsF6]: Static magnetic susceptibility
- Kell Mortensen
- Yaffa Tomkiewicz
- et al.
- 1982
- Physical Review B
PaperElectronic structure of T5T9 metallic glasses (T5=Nb,Ta; T9=Rh,Ir) studied by photoelectron spectroscopy
- A. DasGupta
- P. Oelhafen
- et al.
- 1982
- Physical Review B
PaperPhase transitions of tetraselenafulvalene-tetracyanoquinodimethane: Acceptor-stack doping and the roles of the two kinds of stacks
- H.B. Brom
- T.D. Schultz
- et al.
- 1982
- Physical Review B
PaperTheory of local-work-function determination by photoemission from rare-gas adsorbates
- N.D. Lang
- A.R. Williams
- 1982
- Physical Review B
PaperCluster-size distribution in Al-Al2O3 films near the metal-insulator transition
- R.B. Laibowitz
- E.I. Alessandrini
- et al.
- 1982
- Physical Review B
PaperSurface-plasmon-polariton resonance factors in a classical calculation of surface-enhanced Raman scattering
- G.S. Agarwal
- Sudhanshu S. Jha
- et al.
- 1982
- Physical Review B
Paper