Publications

9289 results for Computer Science

Overlay improvement roadmap: Strategies for scanner control and product disposition for 5-nm overlay
- - Nelson M. Felix
  - Allen H. Gabor
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Reconciling measurements in AFM reference metrology when using different probing techniques
- - Narender Rana
  - Charles Archie
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Adaptive optimization in the Jalapeño JVM
- - Matthew Arnold
  - Stephen Fink
  - et al.
- 2011
- ACM SIGPLAN Notices
Paper
Revisit pattern collapse for 14nm node and beyond
- - Kenji Yoshimoto
  - Craig Higgins
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- - Chris Bencher
  - Jeffrey Smith
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- - Luisa D. Bozano
  - Phillip J. Brock
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Visualization of the develop process
- - Linda K. Sundberg
  - Gregory M. Wallraff
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Systematic studies on reactive ion etch-induced deformations of organic underlayers
- - Martin Glodde
  - Sebastian Engelmann
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper