Principles and techniques of STM lithography
- Mark A. McCord
- Roger Fabian W. Pease
- 1993
- SPIE Advanced Optical Technologies 1993
Conference paper
Publications
3608 results for Mathematical Sciences
Atomic force microscopy experimentation at surfaces: Hardness, wear and lithographic applications
- T.A. Jung
- A. Moser
- et al.
- 1993
- SPIE Advanced Optical Technologies 1993
Conference paperSubharmonic self-locking of a Josephson soliton oscillator coupled to a resonator
- J. Holm
- Paola Barbara
- et al.
- 1993
- Physica D: Nonlinear Phenomena
PaperCharacterization and simulation of acid catalyzed DUV positive photoresist
- Nicholas K. Eib
- Eytan Barouch
- et al.
- 1993
- Microlithography 1993
Conference paperThe influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists
- V. Rao
- W.D. Hinsberg
- et al.
- 1993
- Microlithography 1993
Conference paperAcid-catalyzed single-layer resists for ArF lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1993
- Microlithography 1993
Conference paperComparison of liquid- And vapor-phase silylation processes for 193-nm positive-tone lithography
- Mark A. Hartney
- Roderick R. Kunz
- et al.
- 1993
- Microlithography 1993
Conference paperInfluence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Conference paperNew chemistry in the i)esign of chemically amplified positive resists
- Robert D. Allen
- Quan P. Ly
- et al.
- 1993
- Microlithography 1993
Conference paperBase-catalyzed photosensitive polyimide
- Dennis R. McKean
- Gregory M. Waliraff
- et al.
- 1993
- Microlithography 1993
Conference paper