Factors Affecting the Molybdenum Line Slope by Reactive Ion Etching
- Yue Kuo
- 2019
- JES
Paper
Publications
24860 results for Exploratory Science
Reactive Ion Etching of PECVD n+ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor Preparation
- M.S. Crowder
- 2019
- JES
PaperLaser-Assisted Etching of Manganese-Zinc-Ferrite
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- Arunava Gupta
- et al.
- 2019
- JES
PaperProcess Damage and Contamination Effects for Shallow Si Implanted GaAs
- H. Baratte
- A.J. Fleischman
- et al.
- 2019
- JES
PaperEpitaxial Growth and Selectivity of AlxGa1-xAs Using Novel Metalorganic Precursors
- M.S. Goorsky
- T.F. Kuech
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- 2019
- JES
PaperA Novel Scheme for Detection of Defects in III-V Semiconductors by Cathodoluminescence
- Larry M. Glassman
- Martin P. Scott
- 2019
- JES
PaperSidewall Spacer Technology for MOS and Bipolar Devices
- Sang H. Dhong
- Edward J. Petrillo
- 2019
- JES
PaperRefinement of Zinc Silicate Phosphor Synthesis
- I.F. Chong
- J.M. Brownlow
- et al.
- 2019
- JES
PaperRedeposition during Deep Trench Etching
- Jacob Jorne
- 2019
- JES
PaperX-Ray Damage Considerations in MOSFET Devices
- J.R. Maldonado
- S.S. Iyer
- 2019
- JES
Paper