Characterization and simulation of acid catalyzed DUV positive photoresist
- Nicholas K. Eib
- Eytan Barouch
- et al.
- 1993
- Microlithography 1993
Conference paper
Publications
3613 results for Mathematical Sciences
Acid-catalyzed single-layer resists for ArF lithography
- Roderick R. Kunz
- Robert D. Allen
- et al.
- 1993
- Microlithography 1993
Conference paperInfluence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Conference paperMolecular design for stabilization of chemical amplification resist toward airborne contamination
- Hiroshi Ito
- William P. England
- et al.
- 1993
- Microlithography 1993
Conference paperBase-catalyzed photosensitive polyimide
- Dennis R. McKean
- Gregory M. Waliraff
- et al.
- 1993
- Microlithography 1993
Conference paperNew chemistry in the i)esign of chemically amplified positive resists
- Robert D. Allen
- Quan P. Ly
- et al.
- 1993
- Microlithography 1993
Conference paperResist materials design: Base-catalyzed chemical amplification
- C.G. Wilison
- J.F. Cameron
- et al.
- 1993
- Microlithography 1993
Conference paperThe influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists
- V. Rao
- W.D. Hinsberg
- et al.
- 1993
- Microlithography 1993
Conference paperPorting a calibrated color image across corporate boundaries
- Fred Mintzer
- Ed Pariser
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperData structures and perceptual structures
- Bernice E. Rogowitz
- Lloyd A. Treinish
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paper